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@ARTICLE{Deyu:619278,
author = {Deyu, Getnet Kacha and Parikh, Trupen and Wenskat, Marc and
Gonzalez Diaz-Palacio, Isabel and Blick, Robert H. and
Zierold, Robert and Hillert, Wolfgang},
title = {{R}educing the {T}hermal {E}ffects during {C}oating of
{S}uperconducting {R}adio-{F}requency {C}avities: {A} {C}ase
{S}tudy for {A}tomic {L}ayer {D}eposition of {A}lumina with
a {C}ombined {N}umerical and {E}xperimental {A}pproach},
journal = {Chemistry of materials},
volume = {36},
number = {6},
issn = {0897-4756},
address = {Washington, DC},
publisher = {American Chemical Society},
reportid = {PUBDB-2024-07526},
pages = {2846-2856},
year = {2024},
abstract = {Coating the inner surface of superconducting radio
frequency (SRF) cavities is one of the strategies to push
ultimate limits in next generation accelerators. One of the
potential coating techniques for such intricate and large
volume structures is atomic layer deposition (ALD), as it
offers full and uniform layer coverage. In order to predict
the process parameters for coating SRF cavities on the large
substrates with ALD, we simulate the ALD of alumina
(Al$_2$O$_3$) on the ANSYS Fluent 19.1 commercial package by
solving vapor transport and chemistry equations. The
computational domain in the numerical model is based on the
homemade ALD setup for thin film sample chamber and a 1.3
GHz Tesla-shaped niobium cavity. Trimethlyaluminum (TMA) and
water (H$_2$O) were used as precursors. In the simulation
process for the cavity, two steps were carried out: first,
the simulation of precursor distribution, followed by the
simulation of surface reactions. The simulations show that
saturation is achieved with precursor pulses of only 50 ms
after 1.05 s for TMA and 750 ms for H$_2$O, obviating the
necessity for prolonged exposure times. Furthermore, the
resulting predicted growth per cycle of these process times
of ≈1.22 Å for Al2O3 was experimentally validated,
affirming the credibility of our simulations. Experimental
findings also showcased a remarkable 66.2\% reduction in
process time while upholding film homogeneity and quality.
Our approach presented here carries profound importance,
particularly for coating intricate and large volume
structures, like SRF cavities, and provides another approach
to minimize time- and resource-intensive parameter scans.},
cin = {MVS},
ddc = {540},
cid = {I:(DE-H253)MVS-20120731},
pnm = {621 - Accelerator Research and Development (POF4-621) /
05H21GURB2 - Verbundprojekt 05H2021 - $R\&D$ BESCHLEUNIGER
(TOSCA): Neue Ansätze zur Messung und Modellierung der
Oberflächeneigenschaften supraleitender Resonatoren
(BMBF-05H21GURB2) / 05K22GUD - Verbundprojekt 05K2022 -
NOVALIS: Innovative Beschleunigertechnologien für
effiziente Strahlungsquellen. Teilprojekt 1.
(BMBF-05K22GUD)},
pid = {G:(DE-HGF)POF4-621 / G:(DE-Ds200)BMBF-05H21GURB2 /
G:(DE-Ds200)BMBF-05K22GUD},
experiment = {EXP:(DE-MLZ)NOSPEC-20140101},
typ = {PUB:(DE-HGF)16},
UT = {WOS:001180297700001},
doi = {10.1021/acs.chemmater.3c03173},
url = {https://bib-pubdb1.desy.de/record/619278},
}