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@ARTICLE{Deyu:619278,
      author       = {Deyu, Getnet Kacha and Parikh, Trupen and Wenskat, Marc and
                      Gonzalez Diaz-Palacio, Isabel and Blick, Robert H. and
                      Zierold, Robert and Hillert, Wolfgang},
      title        = {{R}educing the {T}hermal {E}ffects during {C}oating of
                      {S}uperconducting {R}adio-{F}requency {C}avities: {A} {C}ase
                      {S}tudy for {A}tomic {L}ayer {D}eposition of {A}lumina with
                      a {C}ombined {N}umerical and {E}xperimental {A}pproach},
      journal      = {Chemistry of materials},
      volume       = {36},
      number       = {6},
      issn         = {0897-4756},
      address      = {Washington, DC},
      publisher    = {American Chemical Society},
      reportid     = {PUBDB-2024-07526},
      pages        = {2846-2856},
      year         = {2024},
      abstract     = {Coating the inner surface of superconducting radio
                      frequency (SRF) cavities is one of the strategies to push
                      ultimate limits in next generation accelerators. One of the
                      potential coating techniques for such intricate and large
                      volume structures is atomic layer deposition (ALD), as it
                      offers full and uniform layer coverage. In order to predict
                      the process parameters for coating SRF cavities on the large
                      substrates with ALD, we simulate the ALD of alumina
                      (Al$_2$O$_3$) on the ANSYS Fluent 19.1 commercial package by
                      solving vapor transport and chemistry equations. The
                      computational domain in the numerical model is based on the
                      homemade ALD setup for thin film sample chamber and a 1.3
                      GHz Tesla-shaped niobium cavity. Trimethlyaluminum (TMA) and
                      water (H$_2$O) were used as precursors. In the simulation
                      process for the cavity, two steps were carried out: first,
                      the simulation of precursor distribution, followed by the
                      simulation of surface reactions. The simulations show that
                      saturation is achieved with precursor pulses of only 50 ms
                      after 1.05 s for TMA and 750 ms for H$_2$O, obviating the
                      necessity for prolonged exposure times. Furthermore, the
                      resulting predicted growth per cycle of these process times
                      of ≈1.22 Å for Al2O3 was experimentally validated,
                      affirming the credibility of our simulations. Experimental
                      findings also showcased a remarkable 66.2\% reduction in
                      process time while upholding film homogeneity and quality.
                      Our approach presented here carries profound importance,
                      particularly for coating intricate and large volume
                      structures, like SRF cavities, and provides another approach
                      to minimize time- and resource-intensive parameter scans.},
      cin          = {MVS},
      ddc          = {540},
      cid          = {I:(DE-H253)MVS-20120731},
      pnm          = {621 - Accelerator Research and Development (POF4-621) /
                      05H21GURB2 - Verbundprojekt 05H2021 - $R\&D$ BESCHLEUNIGER
                      (TOSCA): Neue Ansätze zur Messung und Modellierung der
                      Oberflächeneigenschaften supraleitender Resonatoren
                      (BMBF-05H21GURB2) / 05K22GUD - Verbundprojekt 05K2022 -
                      NOVALIS: Innovative Beschleunigertechnologien für
                      effiziente Strahlungsquellen. Teilprojekt 1.
                      (BMBF-05K22GUD)},
      pid          = {G:(DE-HGF)POF4-621 / G:(DE-Ds200)BMBF-05H21GURB2 /
                      G:(DE-Ds200)BMBF-05K22GUD},
      experiment   = {EXP:(DE-MLZ)NOSPEC-20140101},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:001180297700001},
      doi          = {10.1021/acs.chemmater.3c03173},
      url          = {https://bib-pubdb1.desy.de/record/619278},
}