TY  - JOUR
AU  - Schober, Jan-Christian
AU  - Beck, Esko Erik
AU  - Kao, Ming-Chao
AU  - Kohantorabi, Mona
AU  - Creutzburg, Marcus
AU  - Novikov, Dmitri
AU  - Keller, Thomas F.
AU  - Holtermann, Birger
AU  - Firman, Nadejda
AU  - Caulfield, Lachlan
AU  - Sauter, Eric
AU  - Vonk, Vedran
AU  - Wöll, Christof
AU  - Wang, Yuemin
AU  - Noei, Heshmat
AU  - Eggeler, Yolita
AU  - Stierle, Andreas
TI  - Atomically Smooth Fully Hydroxylated CeO2(001) Films on YSZ(001)
JO  - The journal of physical chemistry / C
VL  - 128
IS  - 46
SN  - 1932-7447
CY  - Washington, DC
PB  - Soc.
M1  - PUBDB-2024-06412
SP  - 19795-19806
PY  - 2024
N1  - L:MB
AB  - CeO2 is an important support material with redox properties interesting for heterogeneouscatalysis and energy conversion applications. Here, we present a facile growth procedurefor epitaxial CeO2(0 0 1) thin films supported by YSZ(0 0 1) suitable for combined catalyticactivity and structural investigations. The growth of the CeO2 thin films was performedusing standard ultra-high-vacuum (UHV) preparation techniques followed by tube furnaceannealing in air. Thorough characterization prior to and after the tube furnace annealingrevealed that this step induces significant restructuring of the film. Complete characterizationby atomic force microscopy (AFM), X-ray reflectivity (XRR), grazing incidence X-raydiffraction (GIXRD), cross-section high-resolution scanning tunneling electron microscopy(HR-STEM), X-ray photo-emission spectroscopy (XPS), and polarization-resolved infraredreflection absorption spectroscopy (IRRAS) showed that the film is fully oxidized and atomicallysmooth with a coherent crystal lattice over the full film thickness. A dislocation networkat the CeO2/YSZ interface compensates the lattice mismatch between film and the YSZ support,yielding a film with bulk lattice parameters. The bulk terminated surface is found tobe defect free with negligible amount of adsorption sites and stabilized by the presence ofhydroxyl groups for polarity compensation.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:001349056300001
DO  - DOI:10.1021/acs.jpcc.4c04438
UR  - https://bib-pubdb1.desy.de/record/616419
ER  -