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@ARTICLE{Volker:601893,
author = {Volker, Alexander and Schmidt, Janis Viktor and Dannheim,
Dominik and Svihra, Peter and Pinto, Mateus Vicente Barreto
and de Oliveira, Rui and Braach, Justus and Yang, Xiao and
Ruat, Marie and Magalhaes, Débora and Centis Vignali,
Matteo and Calderini, Giovanni and Kristiansen, Helge},
title = {{P}ixel detector hybridization and integration with
anisotropic conductive adhesives},
reportid = {PUBDB-2024-00405, arXiv:2312.09883},
year = {2023},
note = {Procceding to IPRD23 conference in Siena 2023},
abstract = {A reliable and cost-effective interconnect technology is
required for the development of hybrid pixel detectors. The
interconnect technology needs to be adapted for the pitch
and die sizes of the respective applications. For
small-scale applications and during the ASIC and sensor
development phase, interconnect technologies must also be
suitable for the assembly of single-dies typically available
from Multi-Project-Wafer submissions. Within the CERN EP
$R\&D$ program and the AIDAinnova collaboration, innovative
and scalable hybridization concepts are under development
for pixel-detector applications in future colliders. This
contribution presents recent results of a newly developed
in-house single-die interconnection process based on
Anisotropic Conductive Adhesives (ACA). The ACA interconnect
technology replaces solder bumps with conductive
micro-particles embedded in an epoxy layer applied as either
film or paste. The electro-mechanical connection between the
sensor and ASIC is achieved via thermocompression of the ACA
using a flip-chip device bonder. A specific pixel-pad
topology is required to enable the connection via
micro-particles and create cavities into which excess epoxy
can flow. This pixel-pad topology is achieved with an
in-house Electroless Nickel Immersion Gold process that is
also under development within the project. The ENIG and ACA
processes are qualified with a variety of different ASICs,
sensors, and dedicated test structures, with pad diameters
ranging from 12 μm to 140 μm and pitches between 20 μm
and 1.3 mm. The produced assemblies are characterized
electrically, with radioactive-source exposures, and in
tests with high-momentum particle beams. A focus is placed
on recent optimization of the plating and interconnect
processes, resulting in an improved plating uniformity and
interconnect yield.},
cin = {FS-DS},
cid = {I:(DE-H253)FS-DS-20120731},
pnm = {622 - Detector Technologies and Systems (POF4-622)},
pid = {G:(DE-HGF)POF4-622},
experiment = {EXP:(DE-MLZ)NOSPEC-20140101},
typ = {PUB:(DE-HGF)25},
eprint = {2312.09883},
howpublished = {arXiv:2312.09883},
archivePrefix = {arXiv},
SLACcitation = {$\%\%CITATION$ = $arXiv:2312.09883;\%\%$},
doi = {10.3204/PUBDB-2024-00405},
url = {https://bib-pubdb1.desy.de/record/601893},
}