TY  - JOUR
AU  - Wang, Yue
AU  - Qin, Shanshan
AU  - Denisov, Nikita
AU  - Kim, Hyesung
AU  - Bad'ura, Zdeněk
AU  - Sarma, Bidyut Bikash
AU  - Schmuki, Patrik
TI  - Reactive Deposition Versus Strong Electrostatic Adsorption (SEA): A Key to Highly Active Single Atom Co‐Catalysts in Photocatalytic H<sub>2</sub> Generation
JO  - Advanced materials
VL  - 35
IS  - 32
SN  - 0935-9648
CY  - Weinheim
PB  - Wiley-VCH
M1  - PUBDB-2024-00256
SP  - 2211814
PY  - 2023
AB  - In recent years, the use of single atoms (SAs) has become of a rapidly increasing significance in photocatalytic H<sub>2</sub> generation; here SA noble metals (mainly Pt SAs) can act as highly effective co-catalysts. The classic strategy to decorate oxide semiconductor surfaces with maximally dispersed SAs relies on “strong electrostatic adsorption” (SEA) of suitable noble metal complexes. In the case of TiO<sub>2</sub> – the classic benchmark photocatalyst – SEA calls for adsorption of cationic Pt complexes such as [(NH<sub>3</sub>)<sub>4</sub>Pt]<sup>2+</sup> which then are thermally reacted to surface-bound SAs. While SEA is widely used in literature, in the present work it is shown by a direct comparison that reactive attachment based on the reductive anchoring of SAs, e.g., from hexachloroplatinic(IV) acid (H<sub>2</sub>PtCl<sub>6</sub>) leads directly to SAs in a configuration with a significantly higher specific activity than SAs deposited with SEA – and this at a significantly lower Pt loading and without any thermal post-deposition treatments. Overall, the work demonstrates that the reactive deposition strategy is superior to the classic SEA concept as it provides a direct electronically well-connected SA-anchoring and thus leads to highly active single-atom sites in photocatalysis.
LB  - PUB:(DE-HGF)16
C6  - 37256585
UR  - <Go to ISI:>//WOS:001020077000001
DO  - DOI:10.1002/adma.202211814
UR  - https://bib-pubdb1.desy.de/record/601547
ER  -