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037 _ _ |a PUBDB-2023-08083
041 _ _ |a English
100 1 _ |a Poder, Kristjan
|0 P:(DE-H253)PIP1030949
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|e Corresponding author
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111 2 _ |a European Advanced Accelerator Concepts Workshop
|g EAAC
|c Isola d'Elba
|d 2023-09-18 - 2023-09-22
|w Italy
245 _ _ |a High-quality polarised electron bunches from colliding pulse injection
260 _ _ |c 2023
336 7 _ |a Conference Paper
|0 33
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336 7 _ |a Other
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336 7 _ |a INPROCEEDINGS
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520 _ _ |a Highly polarised, high current electron bunches from compact laser-plasma accelerators are sought after for numerous application. However, current proposals to produce these beams suffer from intrinsic limitations to the reproducibility, charge, beam shape and final polarisation degree. We propose colliding pulse injection as a technique for the generation of highly polarised electron bunches from pre-polarised plasma targets. Using particle-in-cell simulations, we show that colliding pulse injection enables accurate control of the spin-polarisation during the trapping of electrons, enabling high-current electron bunches with high degrees of polarisation to be generated. Bayesian optimisation is employed to optimise the multi-dimensional parameter space of colliding pulse injection, demonstrating the generation of highly polarised, high-quality electron bunches employing 100-TW class laser technology.
536 _ _ |a 621 - Accelerator Research and Development (POF4-621)
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693 _ _ |a FLASH
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700 1 _ |a Bohlen, Simon
|0 P:(DE-H253)PIP1019641
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|u desy
700 1 _ |a Gong, Zheng
|0 P:(DE-HGF)0
|b 2
700 1 _ |a Quin, Michael
|0 P:(DE-HGF)0
|b 3
700 1 _ |a Tamburini, Matteo
|0 P:(DE-HGF)0
|b 4
856 4 _ |u https://agenda.infn.it/event/35577/contributions/208720/
856 4 _ |u https://bib-pubdb1.desy.de/record/600660/files/EAAC_Poder_20230919.pdf
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856 4 _ |u https://bib-pubdb1.desy.de/record/600660/files/EAAC_Poder_20230919.pdf?subformat=pdfa
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909 C O |o oai:bib-pubdb1.desy.de:600660
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910 1 _ |a Deutsches Elektronen-Synchrotron
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910 1 _ |a Deutsches Elektronen-Synchrotron
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913 1 _ |a DE-HGF
|b Forschungsbereich Materie
|l Materie und Technologie
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914 1 _ |y 2023
920 1 _ |0 I:(DE-H253)MPA4-20220318
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