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@ARTICLE{Heinze:491054,
      author       = {Heinze, Stefan and Krülle, Tim and Ewenz, Lars and Krywka,
                      Christina and Davydok, Anton and Stark, Andreas and Cremer,
                      Rainer and Leyens, Christoph},
      title        = {{I}nfluence of the deposition process and substrate on
                      microstructure, phase composition, and residual stress state
                      on as-deposited {C}r-{A}l-{C} coatings},
      journal      = {Materials and design},
      volume       = {225},
      issn         = {0264-1275},
      address      = {Amsterdam [u.a.]},
      publisher    = {Elsevier Science},
      reportid     = {PUBDB-2022-08229},
      pages        = {111535},
      year         = {2023},
      note         = {Preprint is published in Materials $\&$ Design},
      abstract     = {This paper focuses on the influence of the High Power
                      Pulsed Magnetron Sputtering (HPPMS) and Direct Current
                      Magnetron Sputtering (DCMS) coating deposition processes,
                      the bias voltage, deposition temperature, and substrate on
                      various properties of the as-deposited state of Cr-Al-C thin
                      films. Three substrates with different coefficients of
                      thermal expansion and electrical conductivity were used. To
                      investigate the microstructure, phase composition, residual
                      stress state, and mechanical properties, ex-situ and in situ
                      synchrotron experiments were conducted accompanied by
                      electron microscopy and nanoindentation. As-deposited
                      Cr-Al-C coatings consisted of amorphous and crystalline
                      areas, with the ratio highly dependent on the deposition
                      process and substrate. The crystalline phase was identified
                      as metastable (Cr,Al)$_2$C. The highest crystallinity was
                      determined for DCMS coatings. Increasing temperature and
                      decreasing bias voltage increased coating crystallinity for
                      HPPMS coatings. The influence of the deposition process and
                      bias voltage was highly reduced for the substrate with low
                      electrical conductivity. In-situ investigations of the
                      stress state of amorphous areas revealed, that those were
                      acting as a residual stress buffer. The hardness and
                      Young’s modulus of the coatings were found to increase
                      with crystallinity and were slightly increased for
                      crystalline HPPMS coatings compared to DCMS coatings.},
      cin          = {DOOR ; HAS-User / UDresden / Hereon},
      ddc          = {690},
      cid          = {I:(DE-H253)HAS-User-20120731 / I:(DE-H253)UDresden-20130903
                      / I:(DE-H253)Hereon-20210428},
      pnm          = {6G3 - PETRA III (DESY) (POF4-6G3) / FS-Proposal: I-20170652
                      (I-20170652) / FS-Proposal: I-20180296 (I-20180296)},
      pid          = {G:(DE-HGF)POF4-6G3 / G:(DE-H253)I-20170652 /
                      G:(DE-H253)I-20180296},
      experiment   = {EXP:(DE-H253)P-P03-20150101 / EXP:(DE-H253)P-P07-20150101},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000991089800001},
      doi          = {10.1016/j.matdes.2022.111535},
      url          = {https://bib-pubdb1.desy.de/record/491054},
}