000456053 001__ 456053
000456053 005__ 20250716150143.0
000456053 0247_ $$2doi$$a10.1103/PhysRevLett.126.174801
000456053 0247_ $$2ISSN$$a0031-9007
000456053 0247_ $$2ISSN$$a1079-7114
000456053 0247_ $$2ISSN$$a1092-0145
000456053 0247_ $$2datacite_doi$$a10.3204/PUBDB-2021-01303
000456053 0247_ $$2altmetric$$aaltmetric:104791336
000456053 0247_ $$2pmid$$apmid:33988405
000456053 0247_ $$2WOS$$aWOS:000652836300005
000456053 0247_ $$2openalex$$aopenalex:W3159548170
000456053 037__ $$aPUBDB-2021-01303
000456053 041__ $$aEnglish
000456053 082__ $$a530
000456053 1001_ $$0P:(DE-H253)PIP1021382$$aKirchen, Manuel$$b0$$eCorresponding author
000456053 245__ $$aOptimal Beam Loading in a Laser-Plasma Accelerator
000456053 260__ $$aCollege Park, Md.$$bAPS$$c2021
000456053 3367_ $$2DRIVER$$aarticle
000456053 3367_ $$2DataCite$$aOutput Types/Journal article
000456053 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article$$bjournal$$mjournal$$s1628509446_25597
000456053 3367_ $$2BibTeX$$aARTICLE
000456053 3367_ $$2ORCID$$aJOURNAL_ARTICLE
000456053 3367_ $$00$$2EndNote$$aJournal Article
000456053 520__ $$aApplications of laser-plasma accelerators demand low energy spread beams and high-efficiency operation. Achieving both requires flattening the accelerating fields by controlled beam loading of the plasma wave. Here, we optimize the generation of an electron bunch via localized ionization injection, such that the combination of injected current profile and averaged acceleration dynamics results in optimal beam loading conditions. This enables the reproducible production of 1.2% rms energy spread bunches with 282 MeV and 44 pC at an estimated energy-transfer efficiency of ∼19%. We correlate shot-to-shot variations to reveal the phase space dynamics and train a neural network that predicts the beam quality as a function of the drive laser.
000456053 536__ $$0G:(DE-HGF)POF4-621$$a621 - Accelerator Research and Development (POF4-621)$$cPOF4-621$$fPOF IV$$x0
000456053 588__ $$aDataset connected to CrossRef, Journals: bib-pubdb1.desy.de
000456053 693__ $$0EXP:(DE-MLZ)NOSPEC-20140101$$5EXP:(DE-MLZ)NOSPEC-20140101$$eNo specific instrument$$x0
000456053 7001_ $$0P:(DE-H253)PIP1027758$$aJalas, Soeren$$b1
000456053 7001_ $$0P:(DE-H253)PIP1022096$$aMessner, Philipp$$b2
000456053 7001_ $$0P:(DE-H253)PIP1016482$$aWinkler, Paul Viktor$$b3
000456053 7001_ $$0P:(DE-H253)PIP1024414$$aEichner, Timo$$b4
000456053 7001_ $$0P:(DE-H253)PIP1023364$$aHuebner, Lars$$b5
000456053 7001_ $$0P:(DE-H253)PIP1028488$$aHülsenbusch, Thomas$$b6
000456053 7001_ $$0P:(DE-H253)PIP1087563$$aJeppe, Laurids$$b7
000456053 7001_ $$0P:(DE-H253)PIP1091505$$aParikh, Trupen$$b8
000456053 7001_ $$0P:(DE-H253)PIP1014001$$aSchnepp, Matthias$$b9
000456053 7001_ $$0P:(DE-H253)PIP1014692$$aMaier, Andreas$$b10
000456053 773__ $$0PERI:(DE-600)1472655-5$$a10.1103/PhysRevLett.126.174801$$gVol. 126, no. 17, p. 174801$$p174801$$tPhysical review letters$$v126$$x0031-9007$$y2021
000456053 8564_ $$uhttps://bib-pubdb1.desy.de/record/456053/files/document%283%29.pdf
000456053 8564_ $$uhttps://bib-pubdb1.desy.de/record/456053/files/PhysRevLett.126.174801.pdf$$yOpenAccess
000456053 8564_ $$uhttps://bib-pubdb1.desy.de/record/456053/files/document%283%29.gif?subformat=icon$$xicon
000456053 8564_ $$uhttps://bib-pubdb1.desy.de/record/456053/files/document%283%29.jpg?subformat=icon-180$$xicon-180
000456053 8564_ $$uhttps://bib-pubdb1.desy.de/record/456053/files/document%283%29.jpg?subformat=icon-700$$xicon-700
000456053 8564_ $$uhttps://bib-pubdb1.desy.de/record/456053/files/document%283%29.pdf?subformat=pdfa$$xpdfa
000456053 8564_ $$uhttps://bib-pubdb1.desy.de/record/456053/files/PhysRevLett.126.174801.pdf?subformat=pdfa$$xpdfa$$yOpenAccess
000456053 8767_ $$8INV/21/MAR/005285$$92021-03-04$$d2021-03-04$$eHybrid-OA$$jZahlung erfolgt$$lMasterCard$$zWährung anpassen
000456053 909CO $$ooai:bib-pubdb1.desy.de:456053$$pdnbdelivery$$popenCost$$pVDB$$pdriver$$pOpenAPC$$popen_access$$popenaire
000456053 9101_ $$0I:(DE-H253)_CFEL-20120731$$6P:(DE-H253)PIP1021382$$aCentre for Free-Electron Laser Science$$b0$$kCFEL
000456053 9101_ $$0I:(DE-HGF)0$$6P:(DE-H253)PIP1021382$$aExternal Institute$$b0$$kExtern
000456053 9101_ $$0I:(DE-H253)_CFEL-20120731$$6P:(DE-H253)PIP1027758$$aCentre for Free-Electron Laser Science$$b1$$kCFEL
000456053 9101_ $$0I:(DE-HGF)0$$6P:(DE-H253)PIP1027758$$aExternal Institute$$b1$$kExtern
000456053 9101_ $$0I:(DE-588b)2008985-5$$6P:(DE-H253)PIP1022096$$aDeutsches Elektronen-Synchrotron$$b2$$kDESY
000456053 9101_ $$0I:(DE-H253)_CFEL-20120731$$6P:(DE-H253)PIP1022096$$aCentre for Free-Electron Laser Science$$b2$$kCFEL
000456053 9101_ $$0I:(DE-HGF)0$$6P:(DE-H253)PIP1022096$$aExternal Institute$$b2$$kExtern
000456053 9101_ $$0I:(DE-588b)2008985-5$$6P:(DE-H253)PIP1016482$$aDeutsches Elektronen-Synchrotron$$b3$$kDESY
000456053 9101_ $$0I:(DE-H253)_CFEL-20120731$$6P:(DE-H253)PIP1024414$$aCentre for Free-Electron Laser Science$$b4$$kCFEL
000456053 9101_ $$0I:(DE-HGF)0$$6P:(DE-H253)PIP1024414$$aExternal Institute$$b4$$kExtern
000456053 9101_ $$0I:(DE-588b)2008985-5$$6P:(DE-H253)PIP1023364$$aDeutsches Elektronen-Synchrotron$$b5$$kDESY
000456053 9101_ $$0I:(DE-588b)2008985-5$$6P:(DE-H253)PIP1028488$$aDeutsches Elektronen-Synchrotron$$b6$$kDESY
000456053 9101_ $$0I:(DE-HGF)0$$6P:(DE-H253)PIP1087563$$aExternal Institute$$b7$$kExtern
000456053 9101_ $$0I:(DE-588b)2008985-5$$6P:(DE-H253)PIP1091505$$aDeutsches Elektronen-Synchrotron$$b8$$kDESY
000456053 9101_ $$0I:(DE-H253)_CFEL-20120731$$6P:(DE-H253)PIP1014001$$aCentre for Free-Electron Laser Science$$b9$$kCFEL
000456053 9101_ $$0I:(DE-HGF)0$$6P:(DE-H253)PIP1014001$$aExternal Institute$$b9$$kExtern
000456053 9101_ $$0I:(DE-588b)2008985-5$$6P:(DE-H253)PIP1014692$$aDeutsches Elektronen-Synchrotron$$b10$$kDESY
000456053 9101_ $$0I:(DE-H253)_CFEL-20120731$$6P:(DE-H253)PIP1014692$$aCentre for Free-Electron Laser Science$$b10$$kCFEL
000456053 9101_ $$0I:(DE-HGF)0$$6P:(DE-H253)PIP1014692$$aExternal Institute$$b10$$kExtern
000456053 9131_ $$0G:(DE-HGF)POF4-621$$1G:(DE-HGF)POF4-620$$2G:(DE-HGF)POF4-600$$3G:(DE-HGF)POF4$$4G:(DE-HGF)POF$$aDE-HGF$$bForschungsbereich Materie$$lMatter and Technologies$$vAccelerator Research and Development$$x0
000456053 9130_ $$0G:(DE-HGF)POF3-631$$1G:(DE-HGF)POF3-630$$2G:(DE-HGF)POF3-600$$3G:(DE-HGF)POF3$$4G:(DE-HGF)POF$$aDE-HGF$$bForschungsbereich Materie$$lMaterie und Technologie$$vAccelerator R & D$$x0
000456053 9141_ $$y2021
000456053 915__ $$0StatID:(DE-HGF)0200$$2StatID$$aDBCoverage$$bSCOPUS$$d2021-02-02
000456053 915__ $$0StatID:(DE-HGF)0160$$2StatID$$aDBCoverage$$bEssential Science Indicators$$d2021-02-02
000456053 915__ $$0StatID:(DE-HGF)1230$$2StatID$$aDBCoverage$$bCurrent Contents - Electronics and Telecommunications Collection$$d2021-02-02
000456053 915__ $$0LIC:(DE-HGF)CCBY4$$2HGFVOC$$aCreative Commons Attribution CC BY 4.0
000456053 915__ $$0StatID:(DE-HGF)0600$$2StatID$$aDBCoverage$$bEbsco Academic Search$$d2021-02-02
000456053 915__ $$0StatID:(DE-HGF)1150$$2StatID$$aDBCoverage$$bCurrent Contents - Physical, Chemical and Earth Sciences$$d2021-02-02
000456053 915__ $$0StatID:(DE-HGF)0030$$2StatID$$aPeer Review$$bASC$$d2021-02-02
000456053 915__ $$0StatID:(DE-HGF)0113$$2StatID$$aWoS$$bScience Citation Index Expanded$$d2021-02-02
000456053 915__ $$0StatID:(DE-HGF)0150$$2StatID$$aDBCoverage$$bWeb of Science Core Collection$$d2021-02-02
000456053 915__ $$0StatID:(DE-HGF)0510$$2StatID$$aOpenAccess
000456053 915__ $$0StatID:(DE-HGF)0571$$2StatID$$aDBCoverage$$bSCOAP3 sponsored Journal$$d2021-02-02
000456053 915__ $$0StatID:(DE-HGF)0100$$2StatID$$aJCR$$bPHYS REV LETT : 2019$$d2021-02-02
000456053 915__ $$0StatID:(DE-HGF)0300$$2StatID$$aDBCoverage$$bMedline$$d2021-02-02
000456053 915__ $$0StatID:(DE-HGF)9905$$2StatID$$aIF >= 5$$bPHYS REV LETT : 2019$$d2021-02-02
000456053 915__ $$0StatID:(DE-HGF)0420$$2StatID$$aNationallizenz$$d2021-02-02$$wger
000456053 915__ $$0StatID:(DE-HGF)0199$$2StatID$$aDBCoverage$$bClarivate Analytics Master Journal List$$d2021-02-02
000456053 9201_ $$0I:(DE-H253)CFEL-LUX-20160909$$kCFEL-LUX$$lUNI/EXP$$x0
000456053 9201_ $$0I:(DE-H253)MPA-20200816$$kMPA$$lPlasma Accelerators$$x1
000456053 9201_ $$0I:(DE-H253)MSL-20170609$$kMSL$$lSupraleitende Beschleuniger Technologie$$x2
000456053 9201_ $$0I:(DE-H253)FTX-20210408$$kFTX$$lTechnol. zukünft. Teilchenph. Experim.$$x3
000456053 980__ $$ajournal
000456053 980__ $$aVDB
000456053 980__ $$aI:(DE-H253)CFEL-LUX-20160909
000456053 980__ $$aI:(DE-H253)MPA-20200816
000456053 980__ $$aI:(DE-H253)MSL-20170609
000456053 980__ $$aI:(DE-H253)FTX-20210408
000456053 980__ $$aAPC
000456053 980__ $$aUNRESTRICTED
000456053 9801_ $$aAPC
000456053 9801_ $$aFullTexts