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@INPROCEEDINGS{Wulff:300271,
      author       = {Wulff, Harm and Quaas, M. and Deutsch, H. and Ahrens, Heiko
                      and Fröhlich, M. and Helm, Christiane A.},
      title        = {{F}ormation of palladium hydrides in low temperature
                      $\mathrm{{A}r/{H}_{2}}$-plasma},
      journal      = {Thin solid films},
      volume       = {596},
      issn         = {0040-6090},
      address      = {Amsterdam [u.a.]},
      publisher    = {Elsevier},
      reportid     = {PUBDB-2016-02253},
      pages        = {185-189},
      year         = {2015},
      abstract     = {20 nm thick Pd coatings deposited on Si substrates with 800
                      nm SiO$_{2}$ and 1 nm Cr buffer layers were treated in a
                      2.45 GHz microwave plasma source at 700 W plasma power and
                      40 Pa working pressure without substrate heating. For
                      obtaining information on the effect of energy influx due to
                      ion energy on the palladium films the substrate potential
                      was varied from U$_{sub}$ = 0 V to − 150 V at constant gas
                      flow corresponding to mean ion energies E$_{i}$ from 0.22 eV
                      ∙ cm$^{− 2}$ ∙ s$^{− 1}$ to 1.28 eV ∙ cm$^{− 2}$
                      ∙ s$^{− 1}$.In contrast to high pressure reactions with
                      metallic Pd, under plasma exposure we do not observe solid
                      solutions over a wide range of hydrogen concentration. The
                      hydrogen incorporation in Pd films takes place
                      discontinuously. At 0 V substrate voltage palladium hydride
                      is formed in two steps to PdH$_{0.1}$4 and PdH$_{0.57}$. At
                      − 50 V substrate voltage Pd$_{H0.57}$ is formed directly.
                      However, substrate voltages of − 100 V and − 150 V cause
                      shrinking of the unit cell. We postulate the formation of
                      two fcc vacancy palladium hydride clusters PdH$_{Vac}$(I)
                      and PdH$_{Vac}$(II). Under longtime plasma exposure the fcc
                      PdHVac(II) phase forms cubic PdH$_{1.33}$.The fcc
                      PdH$_{0.57}$ phase decomposes at temperatures > 300 °C to
                      form metallic fcc Pd. The hydrogen removal causes a decrease
                      of lattice defects. In situ high temperature diffractometry
                      measurements also confirm the existence of PdHVac(II) as a
                      palladium hydride phase. Stoichiometric relationship between
                      cubic PdH$_{1.33}$ and fcc PdH$_{Vac}$(II) becomes evident
                      from XR measurements and structure considerations. We assume
                      both phases have the chemical composition Pd$_{3}$H$_{4}$.
                      Up to 700 °C we observe phase transformation between both
                      the fcc PdH$_{Vac}$(II) and cubic PdH$_{1.33}$ phases. These
                      phase transformations could be explained analog to a Bain
                      distortion by displacive solid state structural changes.},
      month         = {Apr},
      date          = {2015-04-20},
      organization  = {42nd International Conference on
                       Metallurgical Coatings and Thin Films,
                       San Diego (USA), 20 Apr 2015 - 24 Apr
                       2015},
      cin          = {DOOR},
      ddc          = {070},
      cid          = {I:(DE-H253)HAS-User-20120731},
      pnm          = {899 - ohne Topic (POF3-899)},
      pid          = {G:(DE-HGF)POF3-899},
      experiment   = {EXP:(DE-H253)D-D4-20150101},
      typ          = {PUB:(DE-HGF)16 / PUB:(DE-HGF)8},
      UT           = {WOS:000366204900031},
      doi          = {10.1016/j.tsf.2015.08.061},
      url          = {https://bib-pubdb1.desy.de/record/300271},
}