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@ARTICLE{Hoger:205921,
      author       = {Hoger, Tim and Rutkowski, Marco and Menneken, Martina and
                      Düsterer, Stefan and Zacharias, Helmut and Siemer, Bjoern},
      title        = {{M}ultiple free electron laser pulse illumination of a
                      carbon coated silicon substrate},
      journal      = {Proceedings of SPIE},
      volume       = {8777},
      issn         = {0277-786X},
      address      = {Bellingham, Wash.},
      publisher    = {SPIE},
      reportid     = {PUBDB-2015-00458},
      pages        = {87770F},
      year         = {2013},
      note         = {© COPYRIGHT Society of Photo-Optical Instrumentation
                      Engineers (SPIE)},
      abstract     = {The fourth generation of XUV-, soft x-ray- and x-ray-light
                      sources, like the free electron lasers FLASH and
                      FERMI@Elettra, leads to new seminal scientific findings and
                      technical challenges. For the facilities the question of the
                      beam transport is of utmost importance. To provide a good
                      reflectivity over a large range of photon energies up to
                      about 300 eV mostly carbon coated silicon mirrors
                      illuminated under gracing incidence angle are mostly chosen.
                      Thereby the coating for the mirrors must tolerate high light
                      intensities at high photon energies and also high repetition
                      rates. In the present experiment an amorphous carbon coated
                      silicon substrate was illuminated at photon energies of 21
                      nm (58 eV) and an average pulse energy of ~27 μJ. The
                      ellipsoidal spot size of 300 μm × 600 μm at FLASH leads
                      to a fluence of 0.019 J/cm2. The influence of multiple (100
                      - 20.000) light pulses to the coated surface is analyzed.
                      Depending on the number of pulses a change in reflectivity
                      is visible under a light microscope. Both an AFM profile and
                      measurements with a profilometer yield no topological
                      changes. The investigation of the illuminated spots with a
                      microfocus Raman spectrometer shows a decrease of the carbon
                      signal at higher pulse repetition rates.},
      month         = {Apr},
      date          = {2015-04-13},
      organization  = {SPIE Optics + Optoelectronics:
                       Advances in X-ray Free-Electron Laser
                       Instrumentation, Prague (Czech
                       Republic), 13 Apr 2015 - 16 Apr 2015},
      cin          = {DOOR},
      ddc          = {620},
      cid          = {I:(DE-H253)HAS-User-20120731},
      pnm          = {FLASH Beamline BL3 (POF2-54G16)},
      pid          = {G:(DE-H253)POF2-BL3-20130405},
      experiment   = {EXP:(DE-H253)F-BL3-20150101},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000329577700012},
      doi          = {10.1117/12.2017248},
      url          = {https://bib-pubdb1.desy.de/record/205921},
}