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000205921 1001_ $$0P:(DE-H253)PIP1007797$$aHoger, Tim$$b0
000205921 1112_ $$aSPIE Optics + Optoelectronics: Advances in X-ray Free-Electron Laser Instrumentation$$cPrague$$d2015-04-13 - 2015-04-16$$wCzech Republic
000205921 245__ $$aMultiple free electron laser pulse illumination of a carbon coated silicon substrate
000205921 260__ $$aBellingham, Wash.$$bSPIE$$c2013
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000205921 520__ $$aThe fourth generation of XUV-, soft x-ray- and x-ray-light sources, like the free electron lasers FLASH and FERMI@Elettra, leads to new seminal scientific findings and technical challenges. For the facilities the question of the beam transport is of utmost importance. To provide a good reflectivity over a large range of photon energies up to about 300 eV mostly carbon coated silicon mirrors illuminated under gracing incidence angle are mostly chosen. Thereby the coating for the mirrors must tolerate high light intensities at high photon energies and also high repetition rates. In the present experiment an amorphous carbon coated silicon substrate was illuminated at photon energies of 21 nm (58 eV) and an average pulse energy of ~27 μJ. The ellipsoidal spot size of 300 μm × 600 μm at FLASH leads to a fluence of 0.019 J/cm2. The influence of multiple (100 - 20.000) light pulses to the coated surface is analyzed. Depending on the number of pulses a change in reflectivity is visible under a light microscope. Both an AFM profile and measurements with a profilometer yield no topological changes. The investigation of the illuminated spots with a microfocus Raman spectrometer shows a decrease of the carbon signal at higher pulse repetition rates.
000205921 536__ $$0G:(DE-H253)POF2-BL3-20130405$$aFLASH Beamline BL3 (POF2-54G16)$$cPOF2-54G16$$fPOF II$$x0
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000205921 7001_ $$0P:(DE-H253)PIP1010973$$aRutkowski, Marco$$b1
000205921 7001_ $$0P:(DE-HGF)0$$aMenneken, Martina$$b2
000205921 7001_ $$0P:(DE-H253)PIP1002687$$aDüsterer, Stefan$$b3
000205921 7001_ $$0P:(DE-H253)PIP1007744$$aZacharias, Helmut$$b4
000205921 7001_ $$0P:(DE-H253)PIP1007813$$aSiemer, Bjoern$$b5$$eCorresponding author
000205921 773__ $$0PERI:(DE-600)2398361-9$$a10.1117/12.2017248$$p87770F$$tProceedings of SPIE$$v8777$$x0277-786X$$y2013
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