TY  - JOUR
AU  - Patt, M.
AU  - Wiemann, C.
AU  - Weber, N.
AU  - Escher, M.
AU  - Gloskovskii, A.
AU  - Drube, W.
AU  - Merkel, M.
AU  - Schneider, C. M.
TI  - Bulk sensitive hard x-ray photoemission electron microscopy
JO  - Review of scientific instruments
VL  - 85
IS  - 11
SN  - 1089-7623
CY  - [S.l.]
PB  - American Institute of Physics
M1  - PUBDB-2014-04315
SP  - 113704
PY  - 2014
N1  - (c) AIP Publishing LLC.
AB  - Hard x-ray photoelectron spectroscopy (HAXPES) has now matured into a well-established technique as a bulk sensitive probe of the electronic structure due to the larger escape depth of the highly energetic electrons. In order to enable HAXPES studies with high lateral resolution, we have set up a dedicated energy-filtered hard x-ray photoemission electron microscope (HAXPEEM) working with electron kinetic energies up to 10 keV. It is based on the NanoESCA design and also preserves theperformance of the instrument in the low and medium energy range. In this way, spectromicroscopy can be performed from threshold to hard x-ray photoemission. The high potential of the HAXPEEM approach for the investigation of buried layers and structures has been shown already on a layered and structured SrTiO3 sample. Here, we present results of experiments with test structures to elaborate the imaging and spectroscopic performance of the instrument and show the capabilities of the method to image bulk properties. Additionally, we introduce a method to determine the effective attenuation length of photoelectrons in a direct photoemission experiment.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000345646000266
C6  - pmid:25430117
DO  - DOI:10.1063/1.4902141
UR  - https://bib-pubdb1.desy.de/record/192786
ER  -