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000165924 037__ $$aDESY-2014-00872
000165924 1001_ $$0P:(DE-H253)PIP1000250$$aMatheisen, Axel$$b0$$eCorresponding author
000165924 1112_ $$a16th International Conference on RF Superconductivity$$cParis$$d2013-09-23 - 2013-09-27$$gSRF2013$$wFrance
000165924 245__ $$aElectropolishing for XFEL Cavities Production at Ettore Zanon SpA
000165924 260__ $$c2013
000165924 3367_ $$2DRIVER$$aconferenceObject
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000165924 3367_ $$0PUB:(DE-HGF)24$$2PUB:(DE-HGF)$$aPoster$$bposter$$mposter$$s1415118354_3846
000165924 3367_ $$2BibTeX$$aINPROCEEDINGS
000165924 520__ $$aA new horizontal electropolishing facility has been developed by Ettore Zanon SpA (EZ) and implemented for the series production of the EXFEL cavities at EZ. Main electropolishing done according to EXFEL specification is the first step in the surface treatment process, that is essential to reach high performances.Particular attention has been dedicated to find the best configuration during qualification of the system. Correlation between process variables for industrial application, RF tests at room temperature at Zanon and vertical RF tests at 2 K at DESY are investigated, in order to optimize the removal of Niobium.The facility has been designed for industrial scope, in order to guarantee the required quality and a production rate of 4 cavities per week . One of the most important aspects for design has been the automation of the process that permits to have complete control on it.
000165924 536__ $$0G:(DE-H253)POF2-XFEL-20130405$$aFacility (machine) XFEL (POF2-XFEL-20130405)$$cPOF2-XFEL-20130405$$fPOF II$$x0
000165924 693__ $$0EXP:(DE-H253)XFEL(machine)-20150101$$1EXP:(DE-H253)XFEL-20150101$$5EXP:(DE-H253)XFEL(machine)-20150101$$aXFEL$$eFacility (machine) XFEL$$x0
000165924 7001_ $$0P:(DE-HGF)0$$aRizzi, M.$$b1
000165924 7001_ $$0P:(DE-HGF)0$$aGresele, A.$$b2
000165924 7001_ $$0P:(DE-H253)PIP1001459$$aSteinhau-Kuehl, Nicolai$$b3
000165924 7001_ $$0P:(DE-H253)PIP1013533$$aMichelato, Paolo$$b4
000165924 773__ $$y2013
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000165924 9101_ $$0I:(DE-588b)2008985-5$$6P:(DE-H253)PIP1000250$$aDeutsches Elektronen-Synchrotron$$b0$$kDESY
000165924 9101_ $$0I:(DE-588b)2008985-5$$6P:(DE-H253)PIP1001459$$aDeutsches Elektronen-Synchrotron$$b3$$kDESY
000165924 9101_ $$0I:(DE-HGF)0$$6P:(DE-H253)PIP1013533$$aExternes Institut$$b4$$kExtern
000165924 9132_ $$0G:(DE-HGF)POF3-631$$1G:(DE-HGF)POF3-630$$2G:(DE-HGF)POF3-600$$aDE-HGF$$bForschungsbereich Materie$$lMaterie und Technologie$$vAccelerator R & D$$x0
000165924 9131_ $$0G:(DE-HGF)POF2-54G17$$1G:(DE-HGF)POF2-540$$2G:(DE-HGF)POF2-500$$9G:(DE-H253)POF2-XFEL-20130405$$aDE-H253$$bStruktur der Materie$$lForschung mit Photonen, Neutronen und Ionen (PNI)$$vDESY-participation in XFEL$$x0
000165924 9141_ $$y2013
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000165924 9201_ $$0I:(DE-H253)MKS3-20210408$$kMKS3$$lSupraleitung$$x0
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000165924 9201_ $$0I:(DE-H253)INFN-20120814$$kINFN$$lIstituto Nazionale di Fisica Nucleare$$x2
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