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@INPROCEEDINGS{Zakharova:625335,
      author       = {Zakharova, Margarita and Wong, Jia Chyi and Prasciolu,
                      Mauro and Dresselhaus, Jan Lukas and Fleckenstein, Holger
                      and Chapman, Henry N. and Bajt, Sasa},
      title        = {{M}ultilayer {L}aue {L}enses for focusing {XFEL} beams},
      journal      = {Proceedings of SPIE},
      volume       = {13533},
      issn         = {0038-7355},
      address      = {Bellingham, Wash.},
      publisher    = {SPIE},
      reportid     = {PUBDB-2025-01109},
      pages        = {1353309},
      year         = {2025},
      comment      = {Optics Damage and Materials Processing by EUV/X-ray
                      Radiation (XDam9) : [Proceedings] - SPIE, 2025. - ISBN
                      97815106886299781510688636 - doi:10.1117/12.3057178},
      booktitle     = {Optics Damage and Materials Processing
                       by EUV/X-ray Radiation (XDam9) :
                       [Proceedings] - SPIE, 2025. - ISBN
                       97815106886299781510688636 -
                       doi:10.1117/12.3057178},
      abstract     = {X-ray optical elements in X-ray Free Electron Laser (XFEL)
                      applications experience high thermal loads. Whilereflective
                      optics can spread the incident beam over a larger area to
                      reduce heating, refractive and diffractiveoptics must
                      mitigate this by minimizing X-ray absorption, which
                      necessitates the use of low atomic numbermaterials. To
                      address this challenge, we evaluated various multilayer
                      material pairs and identified Mo2C/SiCas the optimal choice
                      due to its superior diffraction efficiency and thermal
                      stability. Here, we present the novelwedged multilayer Laue
                      lenses (MLLs) which were successfully used to focus XFEL
                      beams at the European XFEL.A lens pair fabricated from the
                      same Mo2C/SiC multilayer of 100 µm deposited thickness was
                      characterized beforeand after XFEL experiment using a
                      laboratory-based X-ray setup. The MLLs maintained stable
                      performancethroughout a week-long XFEL beamtime, with no
                      observed degradation in focusing performance or
                      structuralintegrity. These results demonstrate the
                      robustness and suitability of MLLs for high-intensity X-ray
                      applications.},
      month         = {Apr},
      date          = {2025-04-07},
      organization  = {SPIE Optics + Optoelectronics, Prague
                       (Czech Republic), 7 Apr 2025 - 11 Apr
                       2025},
      cin          = {FS-ML / CFEL-I},
      ddc          = {620},
      cid          = {I:(DE-H253)FS-ML-20120731 / I:(DE-H253)CFEL-I-20161114},
      pnm          = {632 - Materials – Quantum, Complex and Functional
                      Materials (POF4-632) / AIM, DFG project G:(GEPRIS)390715994
                      - EXC 2056: CUI: Advanced Imaging of Matter (390715994)},
      pid          = {G:(DE-HGF)POF4-632 / G:(GEPRIS)390715994},
      experiment   = {EXP:(DE-H253)XFEL-Exp-20150101},
      typ          = {PUB:(DE-HGF)16 / PUB:(DE-HGF)8 / PUB:(DE-HGF)7},
      doi          = {10.1117/12.3057178},
      url          = {https://bib-pubdb1.desy.de/record/625335},
}